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Article Dans Une Revue Thin Solid Films Année : 2020

Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper

Résumé

Amorphous carbon-based coatings deposited on copper substrates by magnetron sputtering at different target to -substrate distances were investigated. Films deposited at short distances as 2 cm presented the best results in terms of morphology, density, and resistivity. Ultraviolet near-infrared range spectrometry measurements determined total reflectance and ellipsometry, extinction coefficient, refraction index, and pseudo bandgap. Amorphous carbon films of 150 nm deposited at 2 cm reduced the total reflectance by up to 60 ± 5% in the near-in-fra-red range when compared to pure copper films. The addition of Fe*boosts the absorption of the coating reducing the total reflectance by up to 70 ± 5% in near-infrared. (Fe*: deposited from stainless-steel target used in direct-current magnetron sputtering). Also, it reduces the electrical resistivity by a factor of 100 compared to that of pure amorphous carbon films. The reduction in total reflectance induced by the presence of the amorphous carbon-based films on copper depends, as expected, on light penetration depth and the absorption coefficient.
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Dates et versions

hal-02929173 , version 1 (06-11-2020)

Identifiants

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Ângela Elisa Crespi, Charles Ballage, Marie Christine Hugon, Jacques Robert, Daniel Lundin, et al.. Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper. Thin Solid Films, 2020, 712, pp.138319. ⟨10.1016/j.tsf.2020.138319⟩. ⟨hal-02929173⟩
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