Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber

David Hofman (1) , Benoit Sassolas (1) , Christophe Michel (1) , Laurent Balzarini (1) , Laurent Pinard (1) , Julien Teillon (1) , Bernard Lagrange (1) , Eleonore Barthelemy-Mazot (1) , Gianpietro Cagnoli (1)

1 LMA - Laboratoire des matériaux avancés

To improve the in situ monitoring of thin films at the Laboratoire des Matériaux Avancés, a broadband optical monitoring of the coated thin films was developed and installed in the biggest ion-beam sputtering machine in the world. Due to the configuration of the coating machine and the chamber strain under vacuum, a standard calibration procedure is impossible and a double-beam optical system is not suitable. A novel theoretical and practical solution to calibrate the measurements was found and is described in this paper. Some relevant results achieved thanks to this technique are discussed as well.

Mots clés: (1205240) Photometry; (1205700) Reflection; OCIS codes: (3101860) Deposition and fabrication

Domaines: Optique [physics.optics]; Science des matériaux [cond-mat.mtrl-sci]

David Hofman, Benoit Sassolas, Christophe Michel, Laurent Balzarini, Laurent Pinard, et al.. Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber. Applied optics, 2017, 56, pp.409 - 409. ⟨10.1364/AO.56.000409⟩. ⟨in2p3-01452267⟩