Spectroscopic study of interfaces in Al/Ni periodic multilayers

K. Le Guen (1) , G. Gamblin (1) , P. Jonnard (1) , M. Salou (2) , J. Ben Youssef (2) , Stéphane Rioual (2) , B. Rouvellou (2)

1 Polytech'Paris-UPMC
2 LMB - Laboratoire de magnétisme de Bretagne

Using electron-induced X-ray emission spectroscopy (XES), we have studied two Al/Ni periodic multilayers that differ only by their annealing temperature: as-deposited and annealed at 115 °C. Our aim is to show that XES can provide further details about the chemistry at the metal-metal interface, in addition to what is obtained by X-ray diffraction. The distribution of valence states exhibiting Al and Ni character is determined from the analysis of the Al and Ni emission bands respectively. The multilayer emission bands are compared to those of reference materials: pure Al and Ni metals as well as AlNi, AlNi and AlNi intermetallics. We provide evidence that, for temperatures up to 115 °C, AlNi is the major component of the multilayer.

Mots clés: Physical Sciences

K. Le Guen, G. Gamblin, P. Jonnard, M. Salou, J. Ben Youssef, et al.. Spectroscopic study of interfaces in Al/Ni periodic multilayers. European Physical Journal: Applied Physics, 2009, 45 (2), pp.1. ⟨10.1051/epjap/2008189⟩. ⟨hal-00480139⟩