Spectroscopic study of interfaces in Al/Ni periodic multilayers

K. Le Guen (1) , G. Gamblin (1) , Philippe Jonnard (1) , M. Salou (2) , J. Ben Youssef (2) , Stéphane Rioual (2) , B. Rouvellou (2)

1 LCPMR - Laboratoire de Chimie Physique - Matière et Rayonnement
2 LMB - Laboratoire de magnétisme de Bretagne

Using electron-induced X-ray emission spectroscopy (XES), we have studied two Al/Ni periodic multilayers that differ only by their annealing temperature: as-deposited and annealed at 115°C. Our aim is to show that XES can provide further details about the chemistry at the metal-metal interface, in addition to what is obtained by X-ray diffraction. The distribution of valence states exhibiting Al 3p and Ni 3d character is determined from the analysis of the Al Kbeta and Ni Lalpha emission bands respectively. The multilayer emission bands are compared to those of reference materials: pure Al and Ni metals as well as Al3Ni, Al3Ni2 and AlNi intermetallics. We provide evidence that, for temperatures up to 115 °C, Al3Ni is the major component of the multilayer.

Mots clés: Metals and alloys; Multilayers; X-ray emission spectra and fluorescence

Domaines: Autre [cond-mat.other]

K. Le Guen, G. Gamblin, Philippe Jonnard, M. Salou, J. Ben Youssef, et al.. Spectroscopic study of interfaces in Al/Ni periodic multilayers. European Physical Journal: Applied Physics, 2009, 45 (2), pp.20502. ⟨10.1051/epjap:2008189⟩. ⟨hal-00844545⟩