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Journal Articles Physics of Plasmas Year : 2014

Ambipolar and non-ambipolar diffusion in an rf plasma source containing a magnetic filter

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Abstract

By placing a magnetic filter across a rectangular plasma source (closed at one end with a ceramic plate and an rf antenna, and terminated at the opposite end by a grounded grid), we experimentally investigate the effect of conducting and insulating source walls on the nature of the plasma diffusion phenomena. The use of a magnetic filter creates a unique plasma, characterized by a high upstream electron temperature (Teu∼5 eV) near the rf antenna and a low downstream electron temperature (Ted∼1 eV) near the grid, which more clearly demonstrates the role of the source wall materials. For conducting walls a net ion current to ground is measured on the grid, and the plasma potential is determined by a mean electron temperature within the source. For insulating walls the plasma potential is determined by the downstream electron temperature (i.e., Vp∼5.2Ted in argon), and the net current to the grid is exactly zero. Furthermore, by inserting a small additional upstream conductor (that can be made floating or grounded through an external circuit switch), we demonstrate that the plasma potential can be controlled and set to a low (Vp∼5.2Ted), or high (Vp∼5.2Teu) value.
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Dates and versions

hal-01549375 , version 1 (28-06-2017)

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Trevor Lafleur, Ane Aanesland. Ambipolar and non-ambipolar diffusion in an rf plasma source containing a magnetic filter. Physics of Plasmas, 2014, 21, pp.063510. ⟨10.1063/1.4885109⟩. ⟨hal-01549375⟩
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