Inhibition of fast electron energy deposition due to preplasma filling of cone-attached targets

J. J. Santos (1, 2) , D. Batani (3) , A. Morace (4) , R. Redaelli (3) , M. Nakatsutsumi (5) , R. Kodama (6) , A. Nishida (7) , N. Ozaki (8) , T. Norimatsu (9) , Y. Aglitskiy , S. Atzeni , A. Schiavi (10) , S. D. Baton (5) , M. Koenig (5) , J. Fuchs (11) , A. Benuzzi-Mounaix (5) , P. Guillou , B. Loupias (12, 13) , T. Vinci (3, 5) , L. Gremillet (14) , C. Rousseaux (15) , M. Drouin , E. Lefebvre (15) , F. Dorchies (1) , C. Fourment (1)

1 CELIA - Centre d'Etudes Lasers Intenses et Applications
2 LOA - Laboratoire d'optique appliquée
3 Dipartimento di Fisica "Giuseppe Occhialini" = Department of Physics "Giuseppe Occhialini" [Milano-Bicocca]
4 UNIMIB - Università degli Studi di Milano-Bicocca = University of Milano-Bicocca
5 LULI - Laboratoire pour l'utilisation des lasers intenses
6 Graduate School of Engineering, Osaka University
7 ISAS - Institute of Space and Astronautical Science
8 Graduate School of Engineering [Suita, Osaka]
9 Osaka University [Osaka]
10 Dipartimento di Energetica
11 OSEB - Origine, structure et évolution de la biodiversité
12 IPNO - Institut de Physique Nucléaire d'Orsay
13 Jefferson Lab - Thomas Jefferson National Accelerator Facility
14 DAM - Direction des Applications Militaires
15 DAM/DIF - DAM Île-de-France

no abstract

Domains: Physics [physics]

J. J. Santos, D. Batani, A. Morace, R. Redaelli, M. Nakatsutsumi, et al.. Inhibition of fast electron energy deposition due to preplasma filling of cone-attached targets. Physics of Plasmas, 2008, 15 (4). ⟨hal-01561886⟩