Inhibition of fast electron energy deposition due to preplasma filling of cone-attached targets

J. J. Santos (1) , D. Batani (2) , A. Morace (3) , R. Redaelli (2) , M. Nakatsutsumi (4) , R. Kodama (5) , A. Nishida (6) , N. Ozaki (7) , T. Norimatsu (8) , Y. Aglitskiy , S. Atzeni , A. Schiavi (9) , S. D. Baton (4) , M. Koenig (4) , J. Fuchs (10) , A. Benuzzi-Mounaix (4) , P. Guillou , B. Loupias (11, 12) , T. Vinci (2, 4) , L. Gremillet (13) , C. Rousseaux (14) , M. Drouin , E. Lefebvre (14) , F. Dorchies (1) , C. Fourment (1)

1 CELIA - Centre d'Etudes Lasers Intenses et Applications
2 Dipartimento di Fisica "Giuseppe Occhialini" = Department of Physics "Giuseppe Occhialini" [Milano-Bicocca]
3 UNIMIB - Università degli Studi di Milano-Bicocca = University of Milano-Bicocca
4 LULI - Laboratoire pour l'utilisation des lasers intenses
5 Graduate School of Engineering, Osaka University
6 ISAS - Institute of Space and Astronautical Science
7 Graduate School of Engineering [Suita, Osaka]
8 Osaka University [Osaka]
9 Dipartimento di Energetica
10 OSEB - Origine, structure et évolution de la biodiversité
11 IPNO - Institut de Physique Nucléaire d'Orsay
12 Jefferson Lab - Thomas Jefferson National Accelerator Facility
13 DAM - Direction des Applications Militaires
14 DAM/DIF - DAM Île-de-France

no abstract

Domaines: Physique [physics]

J. J. Santos, D. Batani, A. Morace, R. Redaelli, M. Nakatsutsumi, et al.. Inhibition of fast electron energy deposition due to preplasma filling of cone-attached targets. Physics of Plasmas, 2008, 15 (4). ⟨hal-01561886⟩