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Journal articles
Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis
Mabel Ruiz-Lopez
1, 2
Hugo Dacasa
3
Benoît Mahieu
3
Magali Lozano
3
Lu Li
3
Philippe Zeitoun
3
Davide Bleiner
1
Mabel Ruiz-Lopez 1, 2
Author
Hugo Dacasa 3
Author
Benoît Mahieu 3
Author IdHAL : benoit-mahieu
Magali Lozano 3
Author
1
EMPA - Swiss Federal Laboratories for Materials Science and Technology [Dübendorf] (Überlandstrasse 129, 8600 Dübendorf - Switzerland)
2
DESY - Deutsches Elektronen-Synchrotron [Hamburg] (Notkestraße 85 D-22607 Hamburg - Germany)
3
LOA - Laboratoire d'optique appliquée (828, boulevard des Maréchaux 91762 Palaiseau Cedex - France)
- ENSTA Paris - École Nationale Supérieure de Techniques Avancées (828, boulevard des Maréchaux 91762 Palaiseau Cedex - France)
- X - École polytechnique (École polytechnique, 91128 Palaiseau Cedex - France)
- CNRS - Centre National de la Recherche Scientifique : UMR7639 (France)
Document type :
Journal articles
Complete list of metadatas
https://hal-ensta-paris.archives-ouvertes.fr//hal-01773850
Contributor : Pierre Zaparucha <>
Submitted on : Monday, April 23, 2018 - 11:18:19 AM
Last modification on : Tuesday, October 6, 2020 - 4:28:06 PM
Contributor : Pierre Zaparucha <>
Submitted on : Monday, April 23, 2018 - 11:18:19 AM
Last modification on : Tuesday, October 6, 2020 - 4:28:06 PM
Links full text
Identifiers
- HAL Id : hal-01773850, version 1
- DOI : 10.1364/AO.57.001315
Collections
ENSTA | CNRS | X-LOA | ENSTA_LOA | X | UNIV-PARIS-SACLAY | X-DEP-PHYS
Citation
Mabel Ruiz-Lopez, Hugo Dacasa, Benoît Mahieu, Magali Lozano, Lu Li, et al.. Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis. Applied optics, Optical Society of America, 2018, 57 (6), ⟨10.1364/AO.57.001315⟩. ⟨hal-01773850⟩
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