Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis

Mabel Ruiz-Lopez 1, 2 Hugo Dacasa 3 Benoît Mahieu 3 Magali Lozano 3 Lu Li 3 Philippe Zeitoun 3 Davide Bleiner 1
1 EMPA - Swiss Federal Laboratories for Materials Science and Technology [Dübendorf]
2 DESY - Deutsches Elektronen-Synchrotron [Hamburg]
3 LOA - Laboratoire d'optique appliquée
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Journal articles
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https://hal-ensta-paris.archives-ouvertes.fr//hal-01773850
Contributor : Pierre Zaparucha <>
Submitted on : Monday, April 23, 2018 - 11:18:19 AM
Last modification on : Wednesday, July 3, 2019 - 10:48:03 AM

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ENSTA | X-LOA | ENSTA_LOA | X | UNIV-PARIS-SACLAY | PARISTECH | X-DEP-PHYS

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Mabel Ruiz-Lopez, Hugo Dacasa, Benoît Mahieu, Magali Lozano, Lu Li, et al.. Non-contact XUV metrology of Ru/B 4 C multilayer optics by means of Hartmann wavefront analysis. Applied optics, Optical Society of America, 2018, 57 (6), ⟨10.1364/AO.57.001315⟩. ⟨hal-01773850⟩

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