Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics - Archive ouverte HAL Access content directly
Journal Articles Applied physics. A, Materials science & processing Year : 2007

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

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Abstract

Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10 degrees incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm.

Dates and versions

hal-01288811 , version 1 (15-03-2016)

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J. Gautier, Franck Delmotte, F. Bridou, M. F. Ravet, Françoise Varniere, et al.. Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics. Applied physics. A, Materials science & processing, 2007, 88 (4), pp.719-725. ⟨10.1007/s00339-007-4041-6⟩. ⟨hal-01288811⟩
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